Comparative study of Cl2 + O2 and HBr + O2 plasma chemistries in respect to silicon reactive-ion etching process
Nomin Lim, Alexander Efremov, Kwang‐Ho Kwon
Topics & Concepts
ChemistryHalogenDissociation (chemistry)PlasmaIonKineticsAnalytical Chemistry (journal)Etching (microfabrication)Atom (system on chip)SiliconYield (engineering)Physical chemistryMaterials scienceChromatographyOrganic chemistryComputer scienceMetallurgyQuantum mechanicsEmbedded systemPhysicsLayer (electronics)AlkylPlasma Diagnostics and ApplicationsSemiconductor materials and devicesMetal and Thin Film Mechanics