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Urea-induced supramolecular self-assembly strategy to synthesize wrinkled porous carbon nitride nanosheets for highly-efficient visible-light photocatalytic degradation

Rui Li, Xianbao Cui, Jingtao Bi, Xiongtao Ji, Xin Li, Na Wang, Yunhai Huang, Xin Huang, Hongxun Hao

2021RSC Advances31 citationsDOIOpen Access PDF

Abstract

Wrinkled porous g-C<sub>3</sub>N<sub>4</sub> nanosheets were fabricated by supramolecular MCA self-templates. Due to the reactant and porogen agent urea, g-C<sub>3</sub>N<sub>4</sub> could be modulated with efficient electron–hole pairs and thus superior photocatalytic degradation performance.

Topics & Concepts

PhotocatalysisCarbon nitrideDegradation (telecommunications)PorosityMaterials scienceVisible spectrumSupramolecular chemistryChemical engineeringSelf-assemblyGraphitic carbon nitrideUreaNitrideCarbon fibersNanotechnologyPhotochemistryChemistryCatalysisOrganic chemistryMoleculeComposite numberOptoelectronicsComposite materialComputer scienceEngineeringTelecommunicationsLayer (electronics)Advanced Photocatalysis TechniquesCovalent Organic Framework ApplicationsZnO doping and properties
Urea-induced supramolecular self-assembly strategy to synthesize wrinkled porous carbon nitride nanosheets for highly-efficient visible-light photocatalytic degradation | Litcius