A theoretical study of the atomic layer deposition of HfO2 on Si(1 0 0) surfaces using tetrakis(ethylmethylamino) hafnium and water
Truong Ba Tai, Jihoon Son, Hyeyoung Shin
Topics & Concepts
Atomic layer depositionHafniumSiliconDeposition (geology)AdsorptionChemistryLayer (electronics)Ligand (biochemistry)Thin filmAtom (system on chip)Materials scienceChemical engineeringAnalytical Chemistry (journal)NanotechnologyInorganic chemistryPhysical chemistryEnvironmental chemistryOrganic chemistrySedimentPaleontologyBiologyBiochemistryEngineeringReceptorComputer scienceZirconiumEmbedded systemSemiconductor materials and devicesElectronic and Structural Properties of OxidesFerroelectric and Negative Capacitance Devices