Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions
Neung-Kyung Yu, Jeong‐Min Lee, Woo‐Hee Kim, Bonggeun Shong
Topics & Concepts
Etching (microfabrication)Density functional theoryRutheniumOxideLimitingMicroelectronicsRuthenium oxideMaterials scienceNanotechnologyChemistryChemical engineeringKineticsNanoscopic scaleComputational chemistryInorganic chemistryCatalysisOrganic chemistryMetallurgyQuantum mechanicsLayer (electronics)PhysicsMechanical engineeringEngineeringSemiconductor materials and devicesElectrocatalysts for Energy ConversionAdvanced Memory and Neural Computing