Environment-friendly chemical mechanical polishing using NaHCO3-activated H2O2 slurry for highly efficient finishing of 4H-SiC (0001) surface
Yu Shen, Haoxiang Wang, Xiaoguang Guo, Shang Gao
Topics & Concepts
PolishingMaterials scienceEnvironmentally friendlyChemical-mechanical planarizationSlurryHydrogen peroxideSilicon carbideSurface roughnessSurface finishChemical engineeringComposite materialOrganic chemistryChemistryEcologyBiologyEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis