Effect of the Processed Material Structure on the Polishing Quality of Optical Surfaces
Yu. D. Filatov, V. I. Sidorko, С. В. Ковалев, V. A. Kovalev
Abstract
The study of the effect of the processed material structure on the effectiveness of polishing and the roughness of the polished surfaces of optical parts and elements made of glass, sitals, and optical and semiconductor crystals showed that that the productivity of removing the processed material increases linearly with an increase in the size of the sludge particles. The coefficient of bulk wear significantly decreases with increasing energy transfer during the polishing of optical and semiconductor crystals and decreases only slightly with the polishing of optical glass and sitals. The roughness parameters of polished surfaces increase linearly with the distance between the layers of molecular fragments or interplanar distances in the material being processed. The ratio η/Ra does not depend on the distance between the layers of molecular fragments in amorphous materials and increases linearly with an increase in the interplanar distance in crystals.