Characteristics of the Te-based chalcogenide films dependently on the parameters of the PECVD process
Leonid Mochalov, Alexander Logunov, Alexey V. Markin, Anna Kitnis, В. М. Воротынцев
Topics & Concepts
ChalcogenideMaterials scienceStoichiometryPlasmaTelluriumDeposition (geology)Ternary operationArgonTorrCrystallizationAnalytical Chemistry (journal)Chemical engineeringOptoelectronicsPhysical chemistryChemistryThermodynamicsPhysicsAtomic physicsComputer scienceMetallurgyBiologyChromatographyProgramming languageEngineeringPaleontologySedimentQuantum mechanicsPhase-change materials and chalcogenidesChalcogenide Semiconductor Thin FilmsNonlinear Optical Materials Research