Development of novel multi-selective slurry with mechanically driven etching for through silicon via chemical mechanical polishing
Eungchul Kim, Sanghwan Choi, Sanghuck Jeon, Hyunho Seok, Jin-ill Cho, Dongjoo Shin, Taesung Kim
Topics & Concepts
Materials scienceSlurryWaferChemical-mechanical planarizationBenzotriazoleEtching (microfabrication)PolishingSiliconAbrasion (mechanical)NanometreComposite materialIsotropic etchingSemiconductorChemical engineeringMetallurgyNanotechnologyOptoelectronicsLayer (electronics)EngineeringAdvanced Surface Polishing TechniquesIntegrated Circuits and Semiconductor Failure AnalysisNear-Field Optical Microscopy