Plasma resistant glass (PRG) for reducing particulate contamination during plasma etching in semiconductor manufacturing: A review
Jae Ho Choi, Won Bin Im, Hyeong-Jun Kim
Topics & Concepts
Materials scienceSublimation (psychology)Reactive-ion etchingEtching (microfabrication)WaferSemiconductorInductively coupled plasmaPlasma etchingQuartzAnalytical Chemistry (journal)Isotropic etchingChemical engineeringMineralogyPlasmaComposite materialNanotechnologyOptoelectronicsChemistryEnvironmental chemistryPsychotherapistQuantum mechanicsPsychologyLayer (electronics)PhysicsEngineeringPlasma Diagnostics and ApplicationsAdvanced ceramic materials synthesisZnO doping and properties