X-Ray Peak Profile Analysis of Silica by Williamson–Hall and Size-Strain Plot Methods
Budi Hariyanto, Dyah Ayu Pramoda Wardani, Neny Kurniawati, Nazopatul Patonah Har, Noviyan Darmawan, Irzaman Irzaman
Abstract
Abstract Annealed silica has been prepared by various annealing temperatures at 800 °C and 1000 °C. The crystallite size and lattice strain of silica were estimated by x-ray diffraction spectra analysis using various calculation methods; Modified Scherrer, Williamson-Hall (W-H), and Size-Strain Plot. Qualitative analysis confirms that the XRD patterns were hexagonal quartz. Annealing temperature cause a change in crystal size and lattice strain and all methods showed a decrease in the value of the crystal size with increasing annealing temperature from 800 °C to 1000 °C.
Topics & Concepts
CrystalliteAnnealing (glass)DiffractionMaterials scienceQuartzAnalytical Chemistry (journal)X-ray crystallographyLattice constantScherrer equationCrystallographyHexagonal crystal systemCondensed matter physicsMineralogyChemistryComposite materialOpticsPhysicsMetallurgyChromatographyX-ray Diffraction in CrystallographyGlass properties and applicationsIron oxide chemistry and applications