Ultralow line edge roughness of hybrid multilayer Extreme ultraviolet resist with vertical molecular wire structure
Jaehyuk Lee, Hyeonseok Ji, Chawon Koh, Juyeong Lee, Ji-Hoo Seok, Jinho Ahn, Chang Gyoun Kim, Jiho Kim, Inhui Hwang, Hyungju Ahn, Kug‐Seung Lee, Sangsul Lee, Dimitrios Kazazis, Prajith Karadan, Yasin Ekinci, Gregory Denbeaux, Ji Young Park, Won‐Joon Son, Seungmin Lee, Tsunehiro Nishi, Bruno La Fontaine, Myung Mo Sung
Topics & Concepts
ResistExtreme ultravioletMaterials scienceEnhanced Data Rates for GSM EvolutionLine (geometry)UltravioletSurface finishOpticsNanotechnologyOptoelectronicsComposite materialPhysicsGeometryEngineeringTelecommunicationsLayer (electronics)LaserMathematicsAdvancements in Photolithography TechniquesSemiconductor materials and devicesThin-Film Transistor Technologies