Machine-learning reinforcement for optimizing multilayered thin films: applications in designing broadband antireflection coatings
Vinh The Tran, Huu-Xuan Mai, Hue Minh Nguyen, Dũng C. Duong, Viet Hoang Vu, Nghia Nhan Hoang, Minh Van Nguyen, Tuan Anh Mai, Hien D. Tong, Hung Q. Nguyen, Quang Dang Nguyen, Thuat Nguyen-Tran
Abstract
The design and fabrication of nanoscale multilayered thin films play an essential role in regulating the operation efficiency of sensitive optical sensors and filters. In this paper, we introduce a packaged tool that employs flexible electromagnetic calculation software with machine learning in order to find the optimized double-band antireflection coatings in intervals of wavelength from 3 to 5 µm and 8 to 12 µm. Instead of computing or modeling an extremely enormous set of thin film structures, this tool enhanced with machine learning can swiftly predict the optical properties of a given structure with <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"> <mml:mo>></mml:mo> <mml:mn>99.7</mml:mn> <mml:mi mathvariant="normal">%</mml:mi> </mml:math> accuracy and a substantial reduction in computation costs. Furthermore, the tool includes two learning methods that can infer a global optimal structure or suitable local optimal ones. Specifically, these well-trained models provide the highest accurate double-band average transmission coefficient combined with the lowest number of layers or the thinnest total thickness starting from a reference multilayered structure. Finally, the more sophisticated enhancement method, called the double deep Q-learning network, exhibited the best performance in finding optimal antireflective multilayered structures with the highest double-band average transmission coefficient of about 98.95%.