Machine learning–driven in situ process monitoring with vibration frequency spectra for chemical mechanical planarization
Jia Liu, Jingyi Zheng, Prahalada Rao, Zhenyu Kong
Topics & Concepts
Chemical-mechanical planarizationSIGNAL (programming language)Process (computing)Frequency domainNoise (video)Anomaly detectionBenchmark (surveying)Signal processingVibrationTime domainArtificial intelligenceComputer scienceElectronic engineeringPattern recognition (psychology)EngineeringAcousticsPolishingDigital signal processingMechanical engineeringComputer visionPhysicsGeographyOperating systemGeodesyImage (mathematics)Programming languageAdvanced machining processes and optimizationAdvanced Surface Polishing TechniquesAdvanced Measurement and Metrology Techniques