Stress-dependent prediction of metastable phase formation for magnetron-sputtered V1−xAlxN and Ti1−xAlxN thin films
Sida Liu, Keke Chang, Denis Mušić, Xiang Chen, Stanislav Mráz, Dimitri Bogdanovski, Marcus Hans, Daniel Primetzhofer, Jochen M. Schneider
Topics & Concepts
Materials scienceThin filmPhase (matter)MetastabilitySputter depositionAb initioSolubilityStress (linguistics)NitridePhysical vapor depositionThermodynamicsChemical physicsSputteringComposite materialNanotechnologyPhysical chemistryLayer (electronics)Quantum mechanicsOrganic chemistryLinguisticsChemistryPhilosophyPhysicsMetal and Thin Film MechanicsGaN-based semiconductor devices and materialsSemiconductor materials and devices