Comparative study between in-plasma and post-plasma chemical processes occurring at the surface of UHMWPE subjected to medium pressure Ar and N2 plasma activation
Parinaz Saadat Esbah Tabaei, Rouba Ghobeira, Pieter Cools, Fatemeh Rezaei, Anton Nikiforov, Rino Morent, Nathalie De Geyter
Topics & Concepts
X-ray photoelectron spectroscopyPlasma activationPlasma cleaningPlasmaDielectric barrier dischargeOxygenPolymerChemical stateAnalytical Chemistry (journal)Materials scienceChemistryAtmospheric pressureSurface modificationChemical engineeringDielectricOrganic chemistryPhysical chemistryGeologyOceanographyQuantum mechanicsPhysicsOptoelectronicsEngineeringSurface Modification and SuperhydrophobicityAdvanced Sensor and Energy Harvesting MaterialsMetal and Thin Film Mechanics