Analysis of mechanically induced subsurface damage and its removal by chemical mechanical polishing for gallium nitride substrate
Hideo Aida, Hidetoshi Takeda, Toshiro Doi
Topics & Concepts
PolishingChemical-mechanical planarizationMaterials scienceCathodoluminescenceGallium nitrideDislocationDiamondTransmission electron microscopyBoron nitrideComposite materialSubstrate (aquarium)Colloidal silicaCrystal (programming language)NanotechnologyOptoelectronicsLayer (electronics)Computer scienceLuminescenceProgramming languageOceanographyGeologyCoatingMetal and Thin Film MechanicsIntegrated Circuits and Semiconductor Failure AnalysisDiamond and Carbon-based Materials Research