A novel green CeO2 polishing slurry and its chemical mechanical action mechanism for achieving atomic-level smoothing of fused silica glass surfaces
Fukun Li, Bai Yang, Haixiang Hu, Guanbo Qiao, Lingzhong Li, Feng Zhang, Xuejun Zhang
Topics & Concepts
PolishingChemical-mechanical planarizationSlurrySmoothingMaterials scienceChemical engineeringMechanism (biology)Action (physics)Composite materialNanotechnologyMetallurgyComputer sciencePhysicsEngineeringQuantum mechanicsComputer visionAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis