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A novel green CeO2 polishing slurry and its chemical mechanical action mechanism for achieving atomic-level smoothing of fused silica glass surfaces

Fukun Li, Bai Yang, Haixiang Hu, Guanbo Qiao, Lingzhong Li, Feng Zhang, Xuejun Zhang

2024Colloids and Surfaces A Physicochemical and Engineering Aspects14 citationsDOI

Topics & Concepts

PolishingChemical-mechanical planarizationSlurrySmoothingMaterials scienceChemical engineeringMechanism (biology)Action (physics)Composite materialNanotechnologyMetallurgyComputer sciencePhysicsEngineeringQuantum mechanicsComputer visionAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis
A novel green CeO2 polishing slurry and its chemical mechanical action mechanism for achieving atomic-level smoothing of fused silica glass surfaces | Litcius