Dual nonionic photoacids synergistically enhanced photosensitivity for chemical amplified resists
Ling‐Yan Peng, Shi‐Li Xiang, Jun‐Dan Huang, Ying‐Yi Ren, Pan Hong, Chong Li, Jun Liu, Ming‐Qiang Zhu
Topics & Concepts
PhotoresistMethacrylatePolymer chemistryHydrolysisChemistryCopolymerPolymerPhotosensitivityPolymerizationCarboxylic acidSulfonic acidChemical modificationMaterials scienceOrganic chemistryOptoelectronicsLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesPhotopolymerization techniques and applications