Effect of the carboxyl group number of the complexing agent on polishing performance of alumina slurry in sapphire CMP
Wei Zhang, Hong Lei, Wenqing Liu, Zefang Zhang
Topics & Concepts
PolishingAbrasiveSlurryChemical-mechanical planarizationMaterials scienceZeta potentialEthylenediaminetetraacetic acidWettingChemical engineeringChelationX-ray photoelectron spectroscopyDispersion (optics)SapphireSurface roughnessComposite materialMetallurgyNanotechnologyNanoparticleEngineeringOpticsPhysicsLaserAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced materials and composites