Atomic layer deposition (ALD) of palladium: from processes to applications
Clément Lausecker, David Muñoz‐Rojas, Matthieu Weber
Abstract
Atomic layer deposition (ALD) has been successfully used for the deposition of palladium (Pd) thin films and nanostructures, with a wide range of applications in fields such as microelectronics, energy conversion, sensors, catalysis, membranes, and sensing devices. Thanks to the self-saturating and surface-selective nature of ALD, it allows for precise control of the amount of Pd deposited on challenging surfaces with different precursor chemistries and customizable processing conditions. This technique can produce low-dimensional nanostructures such as single atoms, nanoclusters, core/shell nanoparticles, and ultrathin continuous films. This article provides an overview of the Pd ALD processes and studies reported to date, highlighting the various precursor chemistries used and the intended applications of the prepared nanostructures. This review opens up prospects and demonstrates the potential of using Pd nanomaterials produced through ALD in real devices.