Area-Selective Atomic Layer Deposition of Metal Oxides on DNA Nanostructures and Its Applications
Liwei Hui, Rachel Nixon, Nathan L. Tolman, Jason M. Mukai, Ruobing Bai, Risheng Wang, Haitao Liu
Abstract
We demonstrate area-selective atomic layer deposition (ALD) of oxides on DNA nanostructures. Area-selective ALD of Al2O3, TiO2, and HfO2 was successfully achieved on both 2D and 3D DNA nanostructures deposited on a polystyrene (PS) substrate. The resulting DNA–inorganic hybrid structure was used as a hard mask to achieve deep etching of a Si wafer for antireflection applications. ALD is a widely used process in coating and thin film deposition; our work points to a way to pattern oxide materials using DNA templates and to enhance the chemical/physical stability of DNA nanostructures for applications in surface engineering.
Topics & Concepts
Atomic layer depositionMaterials scienceNanotechnologyNanostructureLayer (electronics)Substrate (aquarium)Etching (microfabrication)WaferDeposition (geology)Thin filmTemplateCoatingChemical engineeringBiologyPaleontologyGeologySedimentEngineeringOceanographyAdvanced biosensing and bioanalysis techniquesSemiconductor materials and devicesRNA Interference and Gene Delivery