Development of core–shell SiO2@A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica
Chunjing Shi, Yuanhang Fan, Zhenyu Zhang, Xingqiao Deng, Jiaxin Yu, Hongxiu Zhou, Fanning Meng, Junyuan Feng
Topics & Concepts
Materials scienceChemical-mechanical planarizationSlurryPhotocatalysisX-ray photoelectron spectroscopyPolishingChemical engineeringSurface roughnessSiliconNanotechnologyComposite materialMetallurgyCatalysisChemistryOrganic chemistryEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchElectronic and Structural Properties of Oxides