Self-limiting nitrogen/hydrogen plasma radical chemistry in plasma-enhanced atomic layer deposition of cobalt
Ji Liu, Hong-Liang Lü, David Wei Zhang, Michael Nolan
Abstract
Surface NH x species are removed completely on Co(001) surface, but they are incorporated on Co(100) surface with forming Co–N bonds.
Topics & Concepts
RadicalChemistryDesorptionOxidizing agentAtomic layer depositionCobaltMetalLigand (biochemistry)Inorganic chemistryPhotochemistryAdsorptionLayer (electronics)Physical chemistryOrganic chemistryReceptorBiochemistrySemiconductor materials and devicesCatalytic Processes in Materials ScienceCopper Interconnects and Reliability