Role of Temperature, Pressure, and Surface Oxygen Migration in the Initial Atomic Layer Deposition of HfO<sub>2</sub>on Anatase TiO<sub>2</sub>(101)
Giulio D’Acunto, Rosemary Jones, Lucía Pérez Ramírez, Payam Shayesteh, Esko Kokkonen, Foqia Rehman, Florence Lim, Fabrice Bournel, Jean‐Jacques Gallet, Rainer Timm, Joachim Schnadt
Abstract
International audience
Topics & Concepts
X-ray photoelectron spectroscopyAtomic layer depositionOverlayerChemistryOxideAnataseDissociation (chemistry)Inorganic chemistryChemical engineeringPhysical chemistryCatalysisLayer (electronics)Organic chemistryPhotocatalysisEngineeringSemiconductor materials and devicesElectronic and Structural Properties of OxidesFerroelectric and Negative Capacitance Devices