Slurryless electrochemical mechanical polishing of 4-inch 4H–SiC (0001) and (000–1) surfaces
Xu Yang, Xiaozhe Yang, Kazufumi Aoki, Kazuya Yamamura
Topics & Concepts
PolishingWaferMaterials scienceSilicon carbideDiamondChemical-mechanical planarizationSurface roughnessNanometreSurface finishAnodeCarbideGrindingOptoelectronicsElectrochemistryComposite materialMetallurgyElectrodeChemistryPhysical chemistryAdvanced Surface Polishing TechniquesIntegrated Circuits and Semiconductor Failure AnalysisSemiconductor materials and devices