Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process
Tae-Kyoung Kim, Taeyeon Kim, Inae Lee, Kyungho Choi, Kyung‐Duk Zoh
Topics & Concepts
Tetramethylammonium hydroxideOzoneChemistryWastewaterEnvironmental chemistryHydroxideNano-Chemical engineeringChromatographyInorganic chemistryEnvironmental engineeringOrganic chemistryEnvironmental scienceEngineeringAdvanced oxidation water treatmentIndustrial Gas Emission ControlCatalytic Processes in Materials Science