FEATURES OF THE TECHNOLOGICAL PROCESS OF MANUFACTURING SPACE-BASED MICROCHIPS USING CMOS KNS TECHNOLOGY
Vladimir Zolnikov, Светлана Евдокимова, Irina ZHuravlyeva, Елена Маклакова, Анна Илунина
Abstract
The article deals with the technological process of manufacturing CMOS integrated circuits on KNS (silicon on sapphire) structures for space purposes. The technology is based on an n-type CMOS process with one level of polysilicon and two levels of metal. The components of the technological process are analyzed. The sequence of the technological process and its features are given. An example of a description of one of the elements is considered.
Topics & Concepts
CMOSProcess (computing)Space (punctuation)Computer scienceManufacturing engineeringEngineeringElectronic engineeringOperating systemAerospace, Electronics, Mathematical ModelingAdvanced Theoretical and Applied Studies in Material Sciences and Geometry