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Tunable hard x-ray nanofocusing with Fresnel zone plates fabricated using deep etching

Kenan Li, Sajid Ali, Michael Wojcik, Vincent De Andrade, Xiaojing Huang, Hanfei Yan, Yong S. Chu, Evgeny Nazaretski, Ajith Pattammattel, Chris Jacobsen

2020Optica35 citationsDOIOpen Access PDF

Abstract

Fresnel zone plates are used widely for x-ray nanofocusing, due to their ease of alignment and energy tunability. Their spatial resolution is limited in part by their outermost zone width <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"> <mml:mi>d</mml:mi> <mml:msub> <mml:mi>r</mml:mi> <mml:mi>N</mml:mi> </mml:msub> </mml:math> , while their efficiency is limited in part by their thickness <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:msub> <mml:mi>t</mml:mi> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mi mathvariant="normal">z</mml:mi> <mml:mi mathvariant="normal">p</mml:mi> </mml:mrow> </mml:mrow> </mml:msub> </mml:mrow> </mml:math> . We demonstrate the use of Fresnel zone plate optics for x-ray nanofocusing with <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"> <mml:mi>d</mml:mi> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:msub> <mml:mi>r</mml:mi> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mspace width="negativethinmathspace"/> <mml:mi>N</mml:mi> </mml:mrow> </mml:msub> </mml:mrow> <mml:mo>=</mml:mo> <mml:mn>16</mml:mn> <mml:mspace width="thickmathspace"/> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mi mathvariant="normal">n</mml:mi> <mml:mi mathvariant="normal">m</mml:mi> </mml:mrow> </mml:math> outermost zone width and a thickness of about <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:msub> <mml:mi>t</mml:mi> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mi mathvariant="normal">z</mml:mi> <mml:mi mathvariant="normal">p</mml:mi> </mml:mrow> </mml:mrow> </mml:msub> </mml:mrow> <mml:mo>=</mml:mo> <mml:mn>1.8</mml:mn> <mml:mspace width="thickmathspace"/> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mtext>µ</mml:mtext> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mi mathvariant="normal">m</mml:mi> </mml:mrow> </mml:mrow> </mml:math> (or an aspect ratio of 110) with an absolute focusing efficiency of 4.7% at 12 keV, and 6.2% at 10 keV. Using partially coherent illumination at 12 keV, the zone plate delivered a FWHM focus of <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"> <mml:mn>46</mml:mn> <mml:mo>×</mml:mo> <mml:mn>60</mml:mn> <mml:mspace width="thickmathspace"/> <mml:mrow class="MJX-TeXAtom-ORD"> <mml:mi mathvariant="normal">n</mml:mi> <mml:mi mathvariant="normal">m</mml:mi> </mml:mrow> </mml:math> at 12 keV, with the first-order coherent mode in a ptychographic reconstruction showing a probe size of 16 nm FWHM. These optics were fabricated using a combination of metal-assisted chemical etching and atomic layer deposition for the diffracting structures, and silicon wafer back-thinning to produce optics useful for real applications. This approach should enable new higher resolution views of thick materials, especially when energy tunability is required.

Topics & Concepts

Etching (microfabrication)Materials scienceZone plateX-rayOpticsGeometryComposite materialOptoelectronicsPhysicsMathematicsDiffractionLayer (electronics)Advanced X-ray Imaging TechniquesAdvanced Electron Microscopy Techniques and ApplicationsAdvancements in Photolithography Techniques