Nd-doped porous CeO2 abrasives for chemical mechanical polishing of SiO2 films
Yongyu Fan, Jie Jiao, Lang Zhao, Jinkui Tang, Chuandong Chen, Na Fan
Topics & Concepts
Materials scienceChemical-mechanical planarizationPolishingDopingPorosityComposite materialChemical engineeringMetallurgyOptoelectronicsEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced machining processes and optimization