Low-loss metasurface optics down to the deep ultraviolet region
Cheng Zhang, Shawn Divitt, Qingbin Fan, Wenqi Zhu, Amit Agrawal, Yanqing Lu, Ting Xu, Henri J. Lezec
Abstract
Shrinking conventional optical systems to chip-scale dimensions will benefit custom applications in imaging, displaying, sensing, spectroscopy, and metrology. Towards this goal, metasurfaces-planar arrays of subwavelength electromagnetic structures that collectively mimic the functionality of thicker conventional optical elements-have been exploited at frequencies ranging from the microwave range up to the visible range. Here, we demonstrate high-performance metasurface optical components that operate at ultraviolet wavelengths, including wavelengths down to the record-short deep ultraviolet range, and perform representative wavefront shaping functions, namely, high-numerical-aperture lensing, accelerating beam generation, and hologram projection. The constituent nanostructured elements of the metasurfaces are formed of hafnium oxide-a loss-less, high-refractive-index dielectric material deposited using low-temperature atomic layer deposition and patterned using high-aspect-ratio Damascene lithography. This study opens the way towards low-form factor, multifunctional ultraviolet nanophotonic platforms based on flat optical components, enabling diverse applications including lithography, imaging, spectroscopy, and quantum information processing.