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Electrical characterization of a single-crystalline Si quantum well formed by thermal oxidation of ultrathin silicon-on-insulator film (Al/SiO2:c-Si QW/n-Si) for optoelectronic applications

I. Guizani, Mansour Aouassa, Mohammed Bouabdellaoui

2024Applied Physics A20 citationsDOI

Topics & Concepts

Materials scienceThermal oxidationOptoelectronicsSiliconCharacterization (materials science)Silicon on insulatorThermalInsulator (electricity)NanotechnologyPhysicsMeteorologySemiconductor materials and devicesSilicon Nanostructures and PhotoluminescenceSemiconductor materials and interfaces
Electrical characterization of a single-crystalline Si quantum well formed by thermal oxidation of ultrathin silicon-on-insulator film (Al/SiO2:c-Si QW/n-Si) for optoelectronic applications | Litcius