Increasing the critical thickness of SiGe layers on Si substrates using sputter epitaxy method
Takahiro Tsukamoto, Yosuke Aoyagi, Shouta Nozaki, Nobumitsu Hirose, Akifumi Kasamatsu, Toshiaki Matsui, Yoshiyuki Suda
Topics & Concepts
Molecular beam epitaxyMaterials scienceSputteringEpitaxyCrystallinityTransmission electron microscopySurface roughnessSputter depositionSurface finishOptoelectronicsDiffractionAnalytical Chemistry (journal)Thin filmCrystallographyLayer (electronics)NanotechnologyOpticsComposite materialChemistryChromatographyPhysicsSemiconductor Quantum Structures and DevicesThin-Film Transistor TechnologiesSilicon Nanostructures and Photoluminescence