Recent advances in block copolymer self‐assembly: From the lowest to the highest
Ki‐Hyun Kim, Yoon Huh, In-Kyu Song, Du Yeol Ryu, Jeong Gon Son, Joona Bang
Abstract
Abstract A perspective is presented on recent developments in block copolymers (BCPs), capable of forming sub‐10 nm nanostructures and bottlebrush block copolymers (BBCPs), capable of forming supra‐100 nm nanostructures. Over the last few decades, BCP research has emphasized pattern miniaturization for application in next‐generation lithography tools in the semiconductor industry. The first part focuses on the recent efforts that investigated high‐χ linear BCPs evolved from conventional poly(styrene‐ b ‐methyl methacrylate) (PS‐ b ‐PMMA) pairs. Recently, novel BCP structures capable of forming nanostructures with significant periodicities for controlling visible light have gained considerable attention. The second part reviews the literature on BBCPs that exhibit the potential to create supra‐100 nm nanostructures. Finally, the future aspect on BCP lithography is discussed.