Enhanced lithographic performance of polymer-bound PAG photoresists synthesized <i>via</i> RAFT polymerization
Nan Qin, Na Li, Xiang Gao
Abstract
The synthesis of PAG bound polymer photoresist resin via RAFT polymerization can effectively resolve many issues associated with the blending of PAG and resin.
Topics & Concepts
RaftLithographyPolymerizationPolymerReversible addition−fragmentation chain-transfer polymerizationPolymer chemistryResistMaterials scienceChemical engineeringChemistryNanotechnologyRadical polymerizationOptoelectronicsComposite materialEngineeringLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesSynthesis and properties of polymers