Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability
Miika Mattinen, Johanna Schröder, Timo Hatanpää, Georgi Popov, Kenichiro Mizohata, Markku Leskelä, Thomas F. Jaramillo, Michaela Burke Stevens, Stacey F. Bent, Mikko Ritala
Abstract
thin films, our work highlights the importance of thermal and electrochemical (in)stability of sulfides as a crucial step for understanding and engineering materials for energy and other applications.
Topics & Concepts
Atomic layer depositionNickelElectrochemistryMaterials scienceLayer (electronics)Thermal stabilityDeposition (geology)Thin filmNickel sulfideSulfideChemical engineeringLayer by layerNanotechnologyMetallurgyChemistryElectrodePhysical chemistryGeologySedimentPaleontologyEngineeringSemiconductor materials and devicesElectronic and Structural Properties of OxidesChalcogenide Semiconductor Thin Films