A novel water developable tetraphenyltin-based nonchemically-amplified molecular resist for sub-13 nm lithography
Zhihao Wang, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Guoqiang Yang, Yi Li
Abstract
A single-component nonchemically-amplified resist (n-CAR) based on a tetraphenyltin derivative (SnMSF 4 ) was developed for electron beam and extreme ultraviolet lithography, giving resolutions of 20 and 13 nm patterns, respectively.
Topics & Concepts
ResistLithographyMaterials scienceMultiple patterningNanotechnologyOptoelectronicsLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesIntegrated Circuits and Semiconductor Failure Analysis