Anchoring sulfur migration to mitigate Kirkendall voids in nano-twinned copper interconnections for robust and reliable packaging
Zicheng Sa, Shang Wang, He Zhang, Jiayun Feng, Haozhe Li, Jingxuan Ma, Xudong Liu, Qing Sun, Yanhong Tian
Topics & Concepts
Kirkendall effectCopperMaterials scienceAnchoringSulfurMetallurgyNanotechnologyComposite materialStructural engineeringEngineeringCopper Interconnects and ReliabilityElectronic Packaging and Soldering Technologies3D IC and TSV technologies