Partial decarboxylation of hafnium oxide clusters for high resolution lithographic applications
Pin-Chia Liao, Po-Hsiung Chen, Yu‐Fang Tseng, Ting-An Shih, Ting‐An Lin, Tsi-Sheng Gau, Burn-Jeng Lin, Po‐Wen Chiu, Jui-Hsiung Liu
Abstract
Treatment of hafnium clusters Hf 6 O 4 (OH) 4 (RCO 2 ) 12 with LiOH in DCM/H 2 O afforded Hf 6 O 4 (OH) 6 (RCO 2 ) 10 , using which high resolution EUV lithographic patterns can be achieved.
Topics & Concepts
HafniumMaterials scienceDecarboxylationExtreme ultraviolet lithographyLithographyOxideHigh resolutionResolution (logic)OptoelectronicsCatalysisMetallurgyOrganic chemistryChemistryZirconiumComputer scienceGeologyArtificial intelligenceRemote sensingSemiconductor materials and devicesInorganic Chemistry and MaterialsAdvancements in Battery Materials