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Research progress on the application of ceria nanoparticles as abrasives in dielectric layer CMP and post cleaning: Structure, morphology, doping, and mechanism

Xinyu Han, Renhao Liu, Baimei Tan, Fangyuan Wang, Yan Mei, Xinyu Zhao, Jiadong Zhao

2023Colloids and Surfaces A Physicochemical and Engineering Aspects45 citationsDOI

Topics & Concepts

Cerium oxideMaterials scienceChemical-mechanical planarizationCeriumChemical engineeringSurface modificationShallow trench isolationAdsorptionSilicon dioxideOxideParticle sizeDopingNanotechnologyLayer (electronics)MetallurgyChemistryOptoelectronicsTrenchOrganic chemistryEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced materials and composites
Research progress on the application of ceria nanoparticles as abrasives in dielectric layer CMP and post cleaning: Structure, morphology, doping, and mechanism | Litcius