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Well-suppressed interface states and improved transport properties of AlGaN/GaN MIS-HEMTs with PEALD SiN gate dielectric

S. Zhang, Wei Ke, Y.C. Zhang, X. J. Chen, Shuling Huang, Hongbu Yin, Gebing Liu, Tingting Yuan, Yue Zheng, X.H. Wang, Xiangyang Liu

2021Vacuum17 citationsDOI

Topics & Concepts

OptoelectronicsMaterials scienceDielectricInterface (matter)Gallium nitrideGate dielectricNanotechnologyPhysicsTransistorLayer (electronics)Composite materialCapillary numberQuantum mechanicsVoltageCapillary actionGaN-based semiconductor devices and materialsSemiconductor materials and devicesGa2O3 and related materials
Well-suppressed interface states and improved transport properties of AlGaN/GaN MIS-HEMTs with PEALD SiN gate dielectric | Litcius