Litcius/Paper detail

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Robin Graillot-Vuillecot, Anne‐Lise Thomann, Thomas Lecas, C. Cachoncinlle, Éric Millon, Amaël Caillard

2020Vacuum35 citationsDOIOpen Access PDF

Topics & Concepts

Materials scienceSputter depositionThin filmTitaniumArgonAnataseSputteringCrystallinityCavity magnetronCrystalliteSubstrate (aquarium)Deposition (geology)Analytical Chemistry (journal)Composite materialMetallurgyNanotechnologyChemistryPhotocatalysisGeologyOrganic chemistryChromatographyBiochemistryOceanographySedimentCatalysisPaleontologyBiologyMetal and Thin Film MechanicsHigh-Temperature Coating BehaviorsZnO doping and properties
Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films | Litcius