Effect of slurry particles on PVA brush contamination during post-CMP cleaning
Samrina Sahir, Hwi-Won Cho, Palwasha Jalalzai, Suprakash Samanta, Satomi Hamada, Tae‐Gon Kim, Jin-Goo Park
Topics & Concepts
BrushSlurryAbrasiveData scrubbingContaminationMaterials scienceChemical-mechanical planarizationStripping (fiber)Chemical engineeringComposite materialMetallurgyPolishingWaste managementEcologyEngineeringBiologyAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationDiamond and Carbon-based Materials Research