Theoretical validation of inhibition mechanisms of benzotriazole with copper and cobalt for CMP and post-CMP cleaning applications
Heon-Yul Ryu, Chi H. Lee, Sang Uck Lee, Satomi Hamada, Nagendra Prasad Yerriboina, Jin-Goo Park
Topics & Concepts
BenzotriazoleChemical-mechanical planarizationCopperMetalCorrosionChemistryCobaltLayer (electronics)Binding energyErosion corrosion of copper water tubesCorrosion inhibitorInorganic chemistryMaterials scienceAnalytical Chemistry (journal)Chemical engineeringOrganic chemistryEngineeringPhysicsNuclear physicsAdvanced Surface Polishing TechniquesCopper Interconnects and ReliabilityMetal and Thin Film Mechanics