Lorentz near-field electron ptychography
Shengbo You, Peng‐Han Lu, Thomas Schachinger, András Kovács, Rafal E. Dunin‐Borkowski, Andrew Maiden
Abstract
Over the past few years, electron ptychography has drawn considerable attention for its ability to recover high contrast and ultra-high resolution images without the need for high quality electron optics. In this Letter, we focus on electron ptychography's other potential benefits: quantitatively mapping phase variations resulting from magnetic and electric fields over extended fields of view. To this end, we propose an implementation of near-field ptychography that employs an amplitude mask located in the electron microscope's condenser aperture plane. We demonstrate the capabilities of our method by imaging a magnetic Permalloy sample and compare our results with those of off-axis electron holography.