Influence of RF power and CH4 flow rate on properties of diamond-like carbon films deposited by PECVD technique
Thanun Chunjaemsri, Ekachai Chongsereecharoen, Narong Chanlek, Pinit Kidkhunthod, Hideki Nakajima, Sarayut Tunmee, Rattikorn Yimnirun, Saroj Rujirawat
Topics & Concepts
Plasma-enhanced chemical vapor depositionX-ray photoelectron spectroscopyRaman spectroscopyMaterials scienceDiamond-like carbonChemical vapor depositionXANESVolumetric flow rateAnalytical Chemistry (journal)Carbon fibersCarbon filmSubstrate (aquarium)TitaniumDiamondSpectroscopyThin filmChemical engineeringChemistryNanotechnologyOpticsComposite materialChromatographyGeologyOceanographyPhysicsComposite numberQuantum mechanicsMetallurgyEngineeringDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsIon-surface interactions and analysis