Microdroplet-tin plasma sources of EUV radiation driven by solid-state-lasers (Topical Review)
O. O. Versolato, John Sheil, Stefan Witte, W. Ubachs, R. Hoekstra
Abstract
Abstract Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future, solid-state mid-infrared lasers may instead be used to efficiently pump the plasma. Such laser systems have promise to be more compact, better scalable, and have higher wall-plug efficiency. In this Topical Review, we present recent findings made at the Advanced Research Center for Nanolithography (ARCNL) on using 1 and 2 µ m wavelength solid-state lasers for tin target preparation and for driving hot and dense plasma. The ARCNL research ranges from advanced laser development, studies of fluid dynamic response of droplets to impact, radiation-hydrodynamics calculations of, e.g. ion ‘debris’, (EUV) spectroscopic studies of tin laser-produced-plasma as well as high-conversion efficiency operation of 2 µ m wavelength driven plasma.