High k PVP titanium dioxide composite dielectric with low leakage current for thin film transistor
Yuexin Yang, Zhuohui Xu, Tian Qiu, Honglong Ning, Jinyao Zhong, Muyun Li, Dongxiang Luo, Xianzhe Liu, Rihui Yao, Junbiao Peng
Topics & Concepts
DielectricMaterials scienceTitanium dioxideLeakage (economics)High-κ dielectricComposite numberSurface roughnessThin-film transistorBand gapComposite materialPolyvinylpyrrolidoneCapacitanceTransistorOptoelectronicsElectrical engineeringLayer (electronics)ElectrodeChemistryPolymer chemistryEconomicsMacroeconomicsVoltagePhysical chemistryEngineeringSemiconductor materials and devicesThin-Film Transistor TechnologiesZnO doping and properties