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A numerical study on slurry flow with CMP pad grooves

Seok‐Jun Hong, Sung-Hoon Bae, Seulgi Choi, Pengzhan Liu, Hojoong Kim, Taesung Kim

2020Microelectronic Engineering26 citationsDOI

Topics & Concepts

SlurryGroove (engineering)Materials scienceChemical-mechanical planarizationWaferComposite materialPolishingFlow (mathematics)Rotational speedRotation (mathematics)Volumetric flow rateMechanicsMechanical engineeringMetallurgyGeometryMathematicsEngineeringPhysicsNanotechnologyAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationAdhesion, Friction, and Surface Interactions
A numerical study on slurry flow with CMP pad grooves | Litcius