Litcius/Paper detail

Influence of helium incorporation on growth process and properties of aluminum thin films deposited by DC magnetron sputtering

S. Ibrahim, Fatima Zahrae Lahboub, Pascal Brault, Agnès Petit, Amaël Caillard, Éric Millon, Thierry Sauvage, A. Fernández, Anne‐Lise Thomann

2021Surface and Coatings Technology15 citationsDOIOpen Access PDF

Topics & Concepts

CrystallinityArgonSputteringMaterials scienceHeliumSputter depositionThin filmAnalytical Chemistry (journal)Substrate (aquarium)PlasmaAluminiumDeposition (geology)Cavity magnetronPhase (matter)IonPorosityChemical engineeringNanotechnologyComposite materialChemistryChromatographyEngineeringOrganic chemistrySedimentPaleontologyPhysicsOceanographyBiologyGeologyQuantum mechanicsMetal and Thin Film MechanicsZnO doping and propertiesCopper Interconnects and Reliability