Temperature-dependent oxygen annealing effect on the properties of Ga2O3 thin film deposited by atomic layer deposition
Lin Gu, Hong-Ping Ma, Yi Shen, Jie Zhang, Wenjie Chen, Ruo-Yun Yang, Fanzhengshu Wu, Lei Yang, Yuxuan Zeng, Xi-Rui Wang, Jingtao Zhu, Qing‐Chun Zhang
Topics & Concepts
Annealing (glass)Materials scienceX-ray photoelectron spectroscopyAtomic layer depositionAnalytical Chemistry (journal)Thin filmPhotoluminescenceBand gapAmorphous solidTransmission electron microscopyGrain sizeNanotechnologyCrystallographyChemical engineeringChemistryOptoelectronicsMetallurgyEngineeringChromatographyGa2O3 and related materialsZnO doping and propertiesSemiconductor materials and devices